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High-speed visible-blind GaN-based ITO-Schottky photodiodes

机译:高速可见盲GaN基ITO肖特基光电二极管

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摘要

In this paper we present our efforts on the design, fabrication and characterization of high-speed, visible-blind, GaN-based ultra-violet (UV) photodiodes using indium-tin-oxide (ITO) Schottky contacts. ITO is known as a transparent conducting material for the visible and near infrared part of the electromagnetic spectrum. We have investigated the optical properties of thin ITO films in the ultraviolet spectrum The transmission and reflection measurements showed that thin ITO films had better transparencies than thin Au films for wavelengths greater than 280 mn. Using a microwave compatible fabrication process, we have fabricated Au and ITO based Schottky photediodes on n-/n+ GaN epitaxial layers. We have made current-voltage (I-V), spectral quantum efficiency, and high-speed characterization of the fabricated devices. I-V characterization showed us that the Au-Schottky samples had better electrical characteristics mainly due to the larger Schottky barrier. However, due to the better optical transparency, ITO-Schottky devices exhibited higher quantum efficiencies compared to Au-Schottky devices. ITO-Schottky photodiodes with ∼80 nm thick ITO films resulted in a maximum quantum efficiency of 47%, whereas Au-Schottky photodiode samples with ∼10 nm thick Au films displayed a maximum efficiency of 27% in the visible-blind spectrum. UV/visible rejection ratios over three orders of magnitude were obtained for both samples. High-frequency characterization of the devices was performed via pulse-response measurements at 360 nm. ITO-Schottky photodiodes showed excellent high-speed characteristics with rise times as small as 12 psec and RC-time constant limited pulse-widths of 60 psec.
机译:在本文中,我们介绍了我们在使用铟锡氧化物(ITO)肖特基触点的高速,可见盲,基于GaN的紫外(UV)光电二极管的设计,制造和表征方面所做的工作。 ITO被称为用于电磁光谱的可见和近红外部分的透明导电材料。我们已经研究了ITO薄膜在紫外光谱中的光学特性。透射和反射测量表明,对于波长大于280 mn的ITO薄膜,其ITO薄膜的透明性优于Au薄膜。使用微波兼容的制造工艺,我们在n- / n + GaN外延层上制造了基于Au和ITO的肖特基光电二极管。我们已经对所制造的器件进行了电流-电压(I-V),频谱量子效率和高速表征。 I-V表征表明,主要由于肖特基势垒较大,Au-肖特基样品具有更好的电特性。然而,由于更好的光学透明性,ITO-肖特基器件比Au-肖特基器件具有更高的量子效率。 ITO膜厚约80 nm的ITO肖特基光电二极管的最大量子效率为47%,而Au膜厚约10 nm的Au-肖特基光电二极管样品在可见盲光谱中的最大效率为27%。两个样品均获得了超过三个数量级的紫外线/可见光排斥率。器件的高频特性是通过在360 nm处的脉冲响应测量进行的。 ITO-肖特基光电二极管具有出色的高速特性,上升时间小至12皮秒,RC时间常数限制的脉冲宽度为60皮秒。

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